Solexel Achieves Record 20.62% Thin-Silicon Cell Efficiency Utilizing Applied Nanotech's Proprietary Aluminum Metallization Material
Applied Nanotech Holdings, Inc. (OTCBB: APNT) announced that Solexel (www.solexel.com) presented its world record achievement of 20.62% efficiency from 156 mm x 156 mm full-square solar cell using its low cost ultra thin epitaxial silicon film and porous silicon lift-off technology at PV Asia Pacific (APVIA/PVAP) Expo 2012 in Singapore on October 24, 2012. This record thin-silicon efficiency was achieved by Solexel's unique epitaxial cell architecture and proprietary manufacturing process flow, utilizing Applied Nanotech's proprietary aluminum metallization material.
Solexel's disruptive technology and production process is based on proven semiconductor processes mapped and scaled to solar photovoltaics industry. This disruptive technology combines the deposition of ultra thin epitaxial silicon film on the top of a porous silicon layer. The porous silicon layer created on reusable silicon wafer templates allows a lift-off process and the release of the thin film solar cell from the mono-crystalline silicon. This unique technology is a complete ultra thin-silicon total solution based on an extendable modular technology platform for high performance, low cost, scalable PV products.
The Solexel's solar cell structure is based on its innovative back contact/back-junction cell design and manufacturing process flow, and for the metallization of the contacts necessary for solar cell completion Solexel is utilizing ANI's proprietary aluminum metallization material using Solexel's proprietary manufacturing process.
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